X-ray beam line at the NSLS for X-ray absorption studies in material science


The development of the Material Science EXAFS line which covers the energy range of 4 keV to >25 keV is described. The general design parameters of the line have been developed specifically for the application of X-ray absorption spectroscopy to problems in material science. The optics systems consisting of a vertically collimating SiC mirror and a unique four crystal monochromator are described along with results of extensive ray tracing studies. The two backend configurations to be used on this line will also be discussed. (orig.). Sayers,-D.E. (North Carolina State Univ., Raleigh (USA)); Heald,-S.M.; Pick,-M.A. (Brookhaven National Lab., Upton, NY (USA)); Budnick,-J.J. (Connecticut Univ., Storrs (USA)); Stern,-E.A. (Washington Univ., Seattle (USA)); Wong,-J. (General Electric Co., Schenectady, NY (USA). Research and Development Center)